New SMT Equipment: de0 (213)

Allen Bradley	2711-T9C1	Original Factory Seal !

Allen Bradley 2711-T9C1 Original Factory Seal !

New Equipment | Industrial Automation

Product display ​​    Our services  Packing & Delivery 1)100% full New! - Original Factory Seal ! 2)Warranty: 12 months! 3)Package: Original packing with cartons. 4)Delivery time: Shipped in 3 days after payment 5) All the goods will be te

Cambia Automation Limited

Rockwell Allen Bradley	2711-T9C3	high quality

Rockwell Allen Bradley 2711-T9C3 high quality

New Equipment | Industrial Automation

Product display ​​    Our services  Packing & Delivery 1)100% full New! - Original Factory Seal ! 2)Warranty: 12 months! 3)Package: Original packing with cartons. 4)Delivery time: Shipped in 3 days after payment 5) All the goods will be te

Cambia Automation Limited

Parts & Supplies: de0 (223)

Panasonic Durable Panasonic Spare Parts CM402 CM602 FAN N610029094AB Sanyo Denki 109-642

Panasonic Durable Panasonic Spare Parts CM402 CM602 FAN N610029094AB Sanyo Denki 109-642

Parts & Supplies | Assembly Accessories

SMT MACHINE SPARE PARTS PANASONIC CM402 CM602 FAN N610029094AB SANYO DENKI 109-642 Specifications: Brand Name PANASONIC CM402 CM602 FAN N610029094AB SANYO DENKI 109-642 Part number N610029094AB Macine Model PANASOINC CM212 CM301 DT401 CM402

KingFei SMT Tech

Panasonic CE Panasonic Spare Parts CM212 Photo Sensor N610017708AA 3 Month Guarantee

Panasonic CE Panasonic Spare Parts CM212 Photo Sensor N610017708AA 3 Month Guarantee

Parts & Supplies | Assembly Accessories

SMT MACHINE SPARE PARTS PANASONIC CM212 PHOTO SENSOR N610017708AA Specifications: Brand Name PANASONIC CM212 PHOTO SENSOR N610017708AA Part number N610017708AA Model PANASOINC CM212 CM301 DT401 CM402 CM602 NPM MACHINE AND SPARE PARTS Ensur

KingFei SMT Tech

Technical Library: de0 (2)

Silicon Test Wafer Specification for 180 nm Technology

Technical Library | 1999-08-05 10:45:36.0

In 1998, the International 300 mm Initiative (I300I) demonstration and characterization programs will focus on 180 nm technology capability. To support these activities, I300I and equipment supplier demonstration partners must use starting silicon wafers with key parameters specified at a level appropriate level for 180 nm processing, including contamination and lithographic patterning. This document describes I300I's silicon wafer specifications, as developed with the I300I Silicon Working Group (member company technical advisors) and SEMI Standards.

SEMATECH

EUV Lithography -The Successor to Optical Lithography?

Technical Library | 1999-05-07 08:53:21.0

This paper discusses the basic concepts and current state of development of EUV lithography (EUVL), a relatively new form of lithography that uses extreme ultraviolet (EUV) radiation with a wavelength in the range of 10 to 14 nanometer (nm) to carry out projection imaging. Currently, and for the last several decades, optical projection lithography has been the lithographic technique used in the high-volume manufacture of integrated circuits. It is widely anticipated that improvements in this technology will allow it to remain the semiconductor industry's workhorse through the 100 nm generation of devices. However, some time around the year 2005, so-called Next-Generation Lithographies will be required.

Intel Corporation


de0 searches for Companies, Equipment, Machines, Suppliers & Information

de0
Sm t t t t t t t t t t net
  1 2 3 4 5 6 7 8 9 10 Next
Panasonic AM100

ONLINE IPC Training & Certification
Sell Your Used SMT & Test Equipment

Inspection mirrors for electronic rework and repair.


High Precision Fluid Dispensers