Phantom - Reactive Ion Etch (RIE) System
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Phantom - Reactive Ion Etch (RIE) System Description:
The Phantom RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design built on a space-saving platform.
Applications: MEMS, Solid State Lighting, Failure Analysis, Research & Development, Pilot Line.
For more information: http://www.triontech.com ..... Email: info@triontech.com ..... Phone: +1 727-461-1888
Phantom - Reactive Ion Etch (RIE) System was added in Jun 2010
Phantom - Reactive Ion Etch (RIE) System has been viewed 640 times
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