Technical Library | 2005-05-16 12:09:02.0
Low cost techniques for building prototype and low volume SMT printed circuit boards.
Technical Library | 1999-05-07 08:53:21.0
This paper discusses the basic concepts and current state of development of EUV lithography (EUVL), a relatively new form of lithography that uses extreme ultraviolet (EUV) radiation with a wavelength in the range of 10 to 14 nanometer (nm) to carry out projection imaging. Currently, and for the last several decades, optical projection lithography has been the lithographic technique used in the high-volume manufacture of integrated circuits. It is widely anticipated that improvements in this technology will allow it to remain the semiconductor industry's workhorse through the 100 nm generation of devices. However, some time around the year 2005, so-called Next-Generation Lithographies will be required.
Technical Library | 2015-01-26 15:30:00.0
In 2005 Raytheon Technical Services Company, now Raytheon Information, Intelligence and Services (Raytheon IIS), approached Ensil regarding the repair of their manufactured Radar Control Terminal (RCT) units. The RCT TRS P/N 13563090-2, a key component in the AN/MPQ-64 Sentinel System, consisted of outdated parts which caused minor to major unit failures. Ensil repaired the RCT's at every turn, correcting any component with the parts still in circulation (mother boards, displays, power supplies) to provide the client with the best available technology. These repairs were completed to military standards and kept the RCT effective, allowing for the Sentinel radar to remain operational. However, the supply of outdated parts was eventually no longer available. Ensil offered the best possible solution, utilizing the skills of their knowledgeable engineering staff, they would reverse engineer a new computer to replace the obsolete RCT while maintaining the same form, fit and function.
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