Oct 31, 2012 ZESTRON, the globally leading provider of high precision cleaning products and services, is pleased to announce the release of the fall 2012 edition of the ZESTRON News. This edition features a technical report on HYDRON® WS 325 and two case studies.
In early 2012, ZESTRON introduced HYDRON® WS 325, our latest FAST® Technology cleaning agent specifically developed for cleaning water soluble flux residues at low operating concentrations in spray-in-air inline and batch cleaning applications. In the ensuing months, through testing at ZESTRON’s Technical Center as well as utilizing HYDRON® WS 325 at various customer locations, ZESTRON documented the limitations of cleaning OA flux residues with DI-water. This testing and analysis culminated in the SMTA International 2012 paper and presentation titled "Comparative Cleaning Study to Showcase the Effective Removal of OA Flux Residues." Included in this edition of ZESTRON News is an excerpt from the technical paper as originally published in the proceedings of SMTA International, Orlando, Florida, October 14-18, 2012.
Also included in this edition is an update on ZESTRON Asia and the upcoming 2013 ZESTRON Cleaning Webinar Series. To access this latest edition of ZESTRON News, please visit www.zestron.com. To request a copy of the technical paper “Comparative Cleaning Study to Showcase the Effective Removal of OA Flux Residues” in its entirety, please email infousa@zestron.com.
ZESTRON:
Headquartered in Manassas, Virginia, and operating in more than 35 countries, ZESTRON is the globally leading provider of high precision cleaning products, services and training solutions for the electronics manufacturing industry. With five worldwide technical centers and the largest team of chemical engineers in the industry, ZESTRON’s commitment to ensuring that its customers surpass even the most stringent cleaning requirements is without equal.
For additional information and to tour one of our unparalleled technical centers, please email infoUSA@zestron.com.
