Industry News | 2023-06-28 08:02:56.0
European Commission Selected KDPOF along with Three Spanish Companies Getting Access to the 8.1 billion Euro Investment IPCEI for Chip Development
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Industry Directory | Consultant / Service Provider
ISE Labs is Silicon Valley's largest Integrated Circuit Testing Laboratory. We offer a full spectrum of services related to testing of ICs.
Industry Directory | Manufacturer
VERMES Microdispensing is a world leader in the design and manufacture of innovative microdispensing concepts and systems for adhesives, silicones, greases, solvents and other fluids.
New Equipment | Board Handling - Storage
Eureka TD-1001 Fast Super Dryer Low Humidity Dry Cabinet Specs: http://eurekadrytech.com/fast-super-dryer/td-1001 Capacity: 657 Liters Humidity Range: LESS THAN 20% Recovery Time: Recovers to ≤ 20% RH within 30 minutes after accessing door for 30 s
New Equipment | Board Handling - Storage
Eureka TUS-1001 Fast Super Dryer Dry Cabinet Specs: http://eurekadrytech.com/fast-super-dryer/tus-1001 Model: TUS-1001 Fast Super Dryer Capacity: 657 Liters Humidity Range: 10%-50% Recovery Time: Recovers to ≤ 20% RH within 2 hours after accessing
Industry News | 2002-03-08 07:37:46.0
Intel Corp. is expanding its optical networking business to include photonics design and manufacturing, which adds to the company's optoelectronic component and highly integrated optical module capabilities. The announcement is part of Intel's long-term strategy to grow its communications business and be a leading building block supplier for high speed, high capacity optical networks.
Industry News | 2018-09-27 17:08:37.0
Engineered Material Systems, is pleased to introduce the availability of its DF-3505 series dry-film negative photoresists for wafer level metallization processes. This material formulation has been optimized for hot roll lamination and processing on MEMS and IC wafers.
Industry News | 2019-02-21 07:22:25.0
Engineered Material Systemsis pleased to announce the availability of its NR-5000 series liquid negative photoresists for microfluidics and wafer level metallization processes. These material formulations have viscosities optimized for wafer coatings from 5 to 50 µm in thickness.
