New Equipment | Surface Finish
The Phantom RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design bui
New Equipment | Surface Finish
The Sirus T2 Reactive Ion Etcher is a basic plasma etching system designed to etch dielectrics and other films that require fluorine-based chemistries. The small footprint and robust design make it ideal for the lab environment. Applications: MEMS,
New Equipment | Surface Finish
The Minilock-Phantom is the first RIE system in the industry to incorporate a vacuum load-lock on a compact platform. The system has been designed to meet all the safety and equipment needs for the most challenging processes including etch applicatio
New Equipment | Coating Equipment
The Orion PECVD system produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage at extremely low power levels. The system meets all safety, facility and process requirem
New Equipment | Coating Equipment
The Minilock-Orion is a Plasma Enhanced Chemical Vapor Deposition System (PECVD) with a vacuum loadlock that produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage at
New Equipment | Cleaning Equipment
The cost of new stripping systems has escalated to unreasonable levels. Trion has solved this critical problem. The Apollo is a compact, inexpensive and versatile system, which can handle 100-300mm wafers. By employing either ICP or microwave and RF
New Equipment | Surface Finish
The Oracle is the smallest and most flexible full production cluster system on the market. The system consists of a central vacuum transport (CVT), vacuum cassette elevators and up to four process reactors. These process reactors are docked to the ce
New Equipment | Surface Finish
The Titan is a very compact, fully automated, vacuum loadlocked plasma system for semi-conductor production. Available in either Reactive Ion Etch (RIE) configuration, High Density Inductive Coupled Plasma (HDICP) or Plasma Enhanced Chemical Vapor De
New Equipment | Cleaning Equipment
The Gemini is the most compact, inexpensive and versatile system, which can handle 100-300mm wafers. This multi-chamber, high throughput stripping system is designed specifically for the demands of today's production fabs. By employing ICP, microwave
New Equipment | Industrial Automation
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