New SMT Equipment: pilot (Page 2 of 169)

Minilock-Orion - PECVD System with a Vacuum Loadlock

Minilock-Orion - PECVD System with a Vacuum Loadlock

New Equipment | Coating Equipment

The Minilock-Orion is a Plasma Enhanced Chemical Vapor Deposition System (PECVD) with a vacuum loadlock that produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage at

Trion Technology

Process Systems

Process Systems

New Equipment |  

At FEECO we have highly qualified engineers and designers to custom design a system that exceeds your expectations. Whether it is a new or existing process, we can design, layout, supply, and commission your new plant. With our state-of-the-art labor

FEECO International, Inc

Siemens Moore 16169-31

Siemens Moore 16169-31

New Equipment | Industrial Automation

If you need Siemens ,pleases contact Email:unity@mvme.cn Contact: Sandy Lin Email:unity@mvme.cn Skype:onlywnn_1 Telegram:+8618020776786 Mobile(Whatsapp): (+86)-18020776786 QQ :2851195456   Siemens offers a wide range of electrical engineering

XIAMEN YUEHANG COMPUTER ENGINEERING CO.LTD.

Integrated Flat Panel Displays

Integrated Flat Panel Displays

New Equipment |  

Innovative Solutions & Support Integrated Flat Panel Display Systems have been designed for various applications, such as primary flight and navigation display, display of mission data, multifunction display, and display of the engine instrument para

Innovative Solutions and Support

Phantom - Reactive Ion Etch (RIE) System

Phantom - Reactive Ion Etch (RIE) System

New Equipment | Surface Finish

The Phantom RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design bui

Trion Technology

Sirus T2 - Table Top Reactive Ion Etch (RIE) System

Sirus T2 - Table Top Reactive Ion Etch (RIE) System

New Equipment | Surface Finish

The Sirus T2 Reactive Ion Etcher is a basic plasma etching system designed to etch dielectrics and other films that require fluorine-based chemistries. The small footprint and robust design make it ideal for the lab environment. Applications: MEMS,

Trion Technology

Honeywell 51304337-150     MC-TAIH12   HLAI/STI FTA CC red comp

Honeywell 51304337-150 MC-TAIH12 HLAI/STI FTA CC red comp

New Equipment | Industrial Automation

Select the right products & services to meet your needs! PLeases contact us Email:unity@mvme.cn Contact: Sandy Lin Email:unity@mvme.cn Skype:onlywnn_1 Telegram:+8618020776786 Mobile(Whatsapp): (+86)-18020776786 QQ :2851195456 Product: Quali

XIAMEN YUEHANG COMPUTER ENGINEERING CO.LTD.

Printed Circuit Board Prototype

New Equipment |  

At Present the company is concentrating to meet Quick turn around/prototype and a Pilot Order requirement of :- Double Sided Pth & Multilayer upto 12 layers Printed Circuit Bare Board Material FR � 4 ( Nema � Grade ) with board thickness as per cus

Photozone Electronics

Minilock-Phantom - Reactive Ion Etcher (RIE) with a Vacuum Loadlock

Minilock-Phantom - Reactive Ion Etcher (RIE) with a Vacuum Loadlock

New Equipment | Surface Finish

The Minilock-Phantom is the first RIE system in the industry to incorporate a vacuum load-lock on a compact platform. The system has been designed to meet all the safety and equipment needs for the most challenging processes including etch applicatio

Trion Technology

Apollo Stripper

Apollo Stripper

New Equipment | Cleaning Equipment

The cost of new stripping systems has escalated to unreasonable levels. Trion has solved this critical problem. The Apollo is a compact, inexpensive and versatile system, which can handle 100-300mm wafers. By employing either ICP or microwave and RF

Trion Technology


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