2 high throw dc acid copper formulation for vertical continuous electroplating results

Technical Library: high throw dc acid copper formulation for vertical continuous electroplating (Page 1 of 1)

High Throw DC Acid Copper Formulation for Vertical Continuous Electroplating Processes

Technical Library | 2018-10-31 20:35:49.0

The electronics industry has grown immensely over the last few decades owing to the rapid growth of consumer electronics in the modern world. New formulations are essential to fit the needs of manufacturing printed circuit boards and semiconductors. Copper electrolytes for high throwing power applications with high thermal reliability and high throughput are becoming extremely important for manufacturing high aspect ratio circuit boards.Here we discuss innovative DC copper metallization formulations for hoist lines and VCP (Vertical Continues Plating) applications with high thermal reliability and throughput for high aspect ratio PCB manufacturing

MacDermid Inc.

Advanced Cu Electroplating Process for Any Layer Via Fill Applications with Thin Surface Copper

Technical Library | 2019-06-26 23:21:49.0

Copper-filled micro-vias are a key technology in high density interconnect (HDI) designs that have enabled increasing miniaturization and densification of printed circuit boards for the next generation of electronic products. Compared with standard plated through holes (PTHs) copper filled vias provide greater design flexibility, improved signal performance, and can potentially help reduce layer count, thus reducing cost. Considering these advantages, there are strong incentives to optimize the via filling process. This paper presents an innovative DC acid copper via fill formulation, for VCP (Vertical Continues Plating) applications which rapidly fills vias while minimizing surface plating.

MacDermid Inc.

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