Industry News: aqueous technologies dry film resist stripper (Page 1 of 6)

DuPont Electronic Technologies' Printed Circuit Materials Division Announces Price Increase for Riston� Photopolymer Dry Film Resists

Industry News | 2003-06-04 08:27:58.0

DuPont cites rising raw material, transportation and energy costs as reasons for the increase.

SMTnet

DuPont Electronic Technologies To Appoint Insulectro as National Distributor for Circuit Materials

Industry News | 2003-06-16 08:33:59.0

This action is part of the DuPont strategy to build on its leadership position in circuit materials, by expanding and strengthening the level of service and support available to its customers.

SMTnet

SMT Dictionary – Surface Mount Technology Acronym and Abbreviation

Industry News | 2018-12-08 03:29:29.0

SMT Dictionary – Surface Mount Technology Acronym and Abbreviation

Flason Electronic Co.,limited

Weiner International Associates’ Dr. Dietz Completes Tutorial Suite

Industry News | 2011-04-04 15:48:55.0

Executive Associate Dr. Karl H. Dietz, of Weiner International Associates has completed preparation of the tutorial "HDI, Fine Line Processing." This is the capstone of his new suite of tutorials and seminars for bare board and substrate fabrication.

Weiner International Associates

Engineered Material Systems to Showcase Liquid and Dry Film Negative tone Photoresists at Semicon Europa

Industry News | 2016-10-06 09:52:01.0

Engineered Material Systems will exhibit at Semicon Europa, scheduled to take place Oct. 25-27, 2016 in Grenoble, France. Company representatives will showcase both liquid and dry-film negative photoresist for use in microfluidics, wafer level packaging and CMOS applications (TSV sealing/passivation). These material formulations have been optimized for spin coating (liquid) or hot roll lamination (dry film) and processing on MEMS and IC wafers.

Engineered Conductive Materials, LLC

Engineered Material Systems to Showcase Liquid and Dry Film Negative Tone Photoresists at MicroTAS

Industry News | 2017-09-13 14:24:45.0

Engineered Material Systems is pleased to announce plans to exhibit at MicroTAS, scheduled to take place Oct. 22-26, 2017 in Savannah, GA. The company will showcase both liquid and dry-film negative photoresists for use in microfluidics, wafer level packaging and CMOS applications (TSV sealing/passivation). These material formulations have been optimized for spin coating (liquid) or hot roll lamination (dry-film) and processing on MEMS and IC wafers.

Engineered Materials Systems, Inc.

EMS introduces 5 μm thick dry film negative photoresist DF-3505 for metallization processes

Industry News | 2018-09-27 17:08:37.0

Engineered Material Systems, is pleased to introduce the availability of its DF-3505 series dry-film negative photoresists for wafer level metallization processes. This material formulation has been optimized for hot roll lamination and processing on MEMS and IC wafers.

Engineered Materials Systems, Inc.

EMS Introduces Dry Film Negative Photoresist for Sealing Through-Silicon Vias in CMOS Wafers

Industry News | 2018-03-08 18:44:09.0

Engineered Material Systems is pleased to introduce the availability of its DF-3500 series dry-film negative photoresists for wafer level sealing of through-silicon vias. This material formulation has been optimized for hot roll lamination and processing on MEMS and IC wafers.

Engineered Materials Systems, Inc.

Engineered Material Systems Introduces DF-3005 Dry Film Negative Photoresist

Industry News | 2015-06-17 14:45:34.0

Engineered Material Systems is pleased to introduce the DF-3005 Dry Film Negative Photo Resist for use in micro-electromechanical systems (MEMS) and wafer level packaging applications (TSV sealing). This material formulation has been optimized for hot roll lamination and processing on MEMS and IC wafers.

Engineered Materials Systems, Inc.

Engineered Material Systems Debuts DF-4017 Hydrophobic Dry Film Negative Photoresist

Industry News | 2014-05-05 16:29:24.0

Engineered Material Systems, Inc. (EMS) introduces the DF-4017 Dry Film Negative Photoresist for use in micro-electromechanical systems (MEMS).

Engineered Materials Systems, Inc.

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