Water-based, alkaline defluxing for semiconductor electronics HYDRON® SE 230A is a water-based, single-phase cleaning agent specifically developed for the use in dip tank processes. It removes flux residues from a wide range of semiconductor electro
Water-based, pH neutral defluxing agent for spray-in-air cleaning processes VIGON® N 600 is an MPC® Technology based, innovative defluxing product with a revolutionary pH neutral formulation. The cleaning agent was developed for use in spray-in-air
VIGON® RC 303 is a water-based cleaning agent specifically developed to remove all types of baked-on flux residues from reflow ovens and wave solder systems. Also, it removes re-condensed fluxes and emissions from condensation traps and heat exchange
VIGON® SC 200, based on the MPC® Technology (Micro Phase Cleaning), is a water-based cleaning agent designed to clean SMT stencils at room temperature. The cleaning agent reliably removes solder pastes and SMT adhesives in one single process and can
AQUBE® L Series For process safe fine cleaning of assembled PCB’s and Hybrids The new kolb AQUBE® systems are next-generation cleaning systems – even more efficient, even more compact, easy to handle and
ATRON® SP 200 is a water-alkaline surfactant cleaner, specifically developed to remove baked-on fluxes from solder pallets and condensation traps. ATRON® SP 200 can be used for the removal of unsoldered solder pastes from SMT stencils. The cleaner ca
Incorporating the ZESTRON® EYE's 3P-Technology, the ZESTRON® EYE CM monitors and controls wash bath concentration in real time. This stand alone concentration management system easily integrates with batch and inline cleaning systems. It is independe
The World’s First Automated Concentration Measurement System For Electronics Cleaning Processes The ZESTRON® EYE consists of a sensor and a controller that can be fully integrated with commonly used cleaning machine types and manufacturers. Specific
The most advanced ultrasonic stencil cleaning system! Clean solder paste, adhesives and flux residue in one machine Easy loading / unloading only 39" H Uses less chemistry Generates less wastewater Increased ultrasonic cleaning e
Precision Fine Pitch Aperture Cleaners Thousands of dollars less than fully-automatic cleaners Low solvent usage and running costs Fast cleaning time of 1-3 minutes Minimal waste disposal Portable unit can be used directly on the screen printe
