Designed for Conformal Coatings and other Curing applications. LEL Protection. High Solvents, High Solids, Humidity Curing. High Volume Production. Large Area Filters. Reel to Reel Foil Drip liner and removable drip pans for easy maintenance. Convect
Heating system (Heller 1812EXL ) 1. All the heating zones are controlled by PLC through PID 2. Heating separately according to different zones is workable to reduce starting power. 3. Turbo air system can improve air flow and provide high rising t
Electronics Forum | Mon Oct 14 09:31:46 EDT 2002 | russ
First off, are you planning on placing these parts with your placement machine since you mentioned that you do not have an alignment system for rework? I would be leery of handplacing a BGA into paste by steady hand and craned neck alignment. Seco
Electronics Forum | Thu Jul 29 23:21:51 EDT 1999 | CH Lee
I received a request from customer to assemble ceramic substrate (alumina oxide)that printed with a low temperature Copper thick film conductor (the overglaze layer is polymer). The Copper pads are exposed without any coating. This ceramic substrate
Industry News | 2012-11-16 19:02:40.0
Flex Interconnect Technologies (FIT)announces that it will exhibit in Booth #413 at the upcoming BIOMEDevice Exposition, scheduled to take place December 4-5, 2012 at the San Jose Convention Center in California.
Industry News | 2012-01-20 15:30:13.0
Flex Interconnect Technologies (FIT) will exhibit custom flex technology solutions in Booth #426 at the upcoming MD&M West Conference and Expo.
Yamaha Dispensing nozzle KV6-M7113-22X Yamaha smt spare parts smt machine K98-M7193-00X BRG KG7-M9166-00X CYLINDER $SC4-M5A SPEED CONTROLLER KU0-M9228-00X BRKT., CYL.. 2 91317-04008 BOLT, HEX. SOCKET HEAD 91317-06025 BOLT, HEX. SOCKET HEAD
YV100II folder side cylinder KG7-M9236-00X Other yamaha parts: KU7-M9231-00X PLAT, EDGE CLAMP KUO-M9232-00X PLATE2, EDGE KU0-M9233-10X BRACKET, CYLINDER KU0-M9234-00X NUT, SHAFT KU0-M9235-00X SHAFT KG7-M9236-00X CYLINDER KU0-M9237-01X COLLAR
Technical Library | 1999-05-07 08:53:21.0
This paper discusses the basic concepts and current state of development of EUV lithography (EUVL), a relatively new form of lithography that uses extreme ultraviolet (EUV) radiation with a wavelength in the range of 10 to 14 nanometer (nm) to carry out projection imaging. Currently, and for the last several decades, optical projection lithography has been the lithographic technique used in the high-volume manufacture of integrated circuits. It is widely anticipated that improvements in this technology will allow it to remain the semiconductor industry's workhorse through the 100 nm generation of devices. However, some time around the year 2005, so-called Next-Generation Lithographies will be required.
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corners and edges, it makes the math very intense. 2) The more complex your shape, the more 'heavy' your STEP file is. I tried to keep it to a minimum on facets so as not to bog down a system