New SMT Equipment: ion chromatography requirement (Page 1 of 6)

C3 Critical Cleanliness Control

C3 Critical Cleanliness Control

New Equipment | Test Equipment

Localized Electronics Cleanliness Tester and Residue Extractor The information gathered when using the C3 is intended to provide a measure of the cleanliness of a localized region of a circuit board. In addition, the C3 extracts a sample of the effl

UM Technology Co., Ltd.

Ionic Cleanliness Testing

Ionic Cleanliness Testing

New Equipment | Test Equipment

PROCESS SCIENCES, INC. (PSI) Visit our main Ion Chromatography page for more information. Ion Chromatography analysis (IC) is an essential tool for both failure analysis and process validation. PSI uses IC to investigate surface contamination and m

Process Sciences, Inc.

Sirus T2 - Table Top Reactive Ion Etch (RIE) System

Sirus T2 - Table Top Reactive Ion Etch (RIE) System

New Equipment | Surface Finish

The Sirus T2 Reactive Ion Etcher is a basic plasma etching system designed to etch dielectrics and other films that require fluorine-based chemistries. The small footprint and robust design make it ideal for the lab environment. Applications: MEMS,

Trion Technology

Minilock-Phantom - Reactive Ion Etcher (RIE) with a Vacuum Loadlock

Minilock-Phantom - Reactive Ion Etcher (RIE) with a Vacuum Loadlock

New Equipment | Surface Finish

The Minilock-Phantom is the first RIE system in the industry to incorporate a vacuum load-lock on a compact platform. The system has been designed to meet all the safety and equipment needs for the most challenging processes including etch applicatio

Trion Technology

Glyoxylic acid

Glyoxylic acid

New Equipment | Materials

We are the most competitive manufacturer for Glyoxylic acid in China with 1st Class quality as well as the bottom price. Our supply capacity can be 11000mt-20000mt annually. The glyoxylic acid specifications can be as following: Glyoxal can be 0.5% M

Cangzhou Goldlion Chemicals Co.,Ltd

Titan Loadlocked RIE or PECVD with Vacuum Cassette Elevator

Titan Loadlocked RIE or PECVD with Vacuum Cassette Elevator

New Equipment | Surface Finish

The Titan is a very compact, fully automated, vacuum loadlocked plasma system for semi-conductor production. Available in either Reactive Ion Etch (RIE) configuration, High Density Inductive Coupled Plasma (HDICP) or Plasma Enhanced Chemical Vapor De

Trion Technology

PE-100 Plasma Etch Benchtop Plasma System

PE-100 Plasma Etch Benchtop Plasma System

New Equipment | Prototyping

Compact Plasma Etcher The PE-100 is a complete system with vacuum pump designed to be reliable yet inexpensive enough to allow startup companies, medical labs and R&D facilities the opportunity to experience Plasma Etch technology. The all aluminum

Plasma Etch, Inc.

Floating filament isolate high voltage power supply

Floating filament isolate high voltage power supply

New Equipment |  

Product Name FF Power(W) 7.5W-37.5W Output Voltage(KV) ,7.5V, ISO9000:2008 certified precision module .The FF Series is ideal for OEM applications requiring a competitively priced, precision high voltage module. APPLICATIONS Electron Beam/I

Wisman High Voltage Power Supply Co.,LTD.

Capillary Electrophresis high voltage power supply

Capillary Electrophresis high voltage power supply

New Equipment |  

Product Name MT Power(W) 5W-30W,60W Output Voltage(KV) ,0.3,0.5,0.75,1,1.5,2,2.5,3,5,7.5,10,15,20,25,30, ISO9000:2008 certified precision module .The MT Series is ideal for OEM applications requiring a competitively priced, precision high volt

Wisman High Voltage Power Supply Co.,LTD.

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