GE Auction
Type: |
|
Date: |
Fri, Nov 18 - Sat, Dec 31, 2005 |
Description: |
Offered as a complete package
DIFFUSION
Make
Model
General Description
Quantity
SVG
SVG_6105
Vertical Furnace
4
TEL
UL2604_08H
4 Stack Horizontal - HT Anneal
2
TEL
UL2604_08H
4 Stack Horizontal
1
TEL
UL2604_08L
4 Stack Horizontal - LPCVD Silane / N20
1
TEL
UL2604_08L
4 Stack Horizontal - LPCVD Silane
3
TEL
UL2604_08L
4 Stack Horizontal - LP
1
Thermco / SVG
5204_HTR5103
4 Stack Horizontal - POCL
1
Thermco / SVG
5204_HTR5103
4 Stack Horizontal - Wet / Dry Oxide
1
Thermco / SVG
5204_HTR5103
4 Stack Horizontal - Wet Oxide / H2 Anneal
2
Thermco / SVG
5204_HTR5103
4 Stack Horizontal - N2 Anneal / Dry Oxide
1
Thermco / SVG
5204_HTR5103
4 Stack Horizontal - Dry Oxide / Wet Oxide
1
Thermco / SVG
5204_HTR5103
4 Stack Horizontal - Wet Oxide
1
ETCH
Make
Model
General Description
Quantity
Anelva
ILD4015
Oxide Etcher
1
Applied Materials
AME8310
Metal Etcher
9
Applied Materials
AME8310
Oxide Etcher
6
Applied Materials
AME8330
Metal Etcher
12
FUSION
202MCU
Microwave Asher
1
Lam Research
LAM490
Nitride Etcher
5
Lam Research
LAM490
Pad Etcher
1
Lam Research
LAM490
Poly Etcher
2
Lam Research
LAM590
Pad Etcher
5
Lam Research
RAINBOW 4420
Poly Etcher
3
Lam Research
RB4400
Poly Etcher
4
Plasma Systems Corporation (PSC)
PE-615L
Single Wafer Asher
4
Plasma Systems Corporation (PSC)
PSC304
Two Chamber Barrel Asher
1
Plasma Systems Corporation (PSC)
PSC354
Two Chamber Barrel Asher
7
IMPLANT
Make
Model
General Description
Quantity
Varian
120XP
High Current Implant
5
Varian
160XP
High Current Implant
1
Varian
350D
Medium Current Implant
3
METALLIZATION
Make
Model
General Description
Quantity
Ulvac
MCH4500
TI Deposition
2
Varian
V3280
AL / SI Deposition
3
Varian
V3290
AL / SI Deposition
1
PHOTO
Make
Model
General Description
Quantity
Canon
AIM-630
Wafer Tiltler
2
DNS
DNS-629
Resist Coater
1
DNS
DNS-636
Resist Coater
3
DNS
DNS-636
Resist Developer
5
DNS
DNS-636
Solvent Strip - Resist
1
KLA-Tencor
KLA-5011
Overlay Measurement
1
NIKON
NSR1505G4D
G Line Stepper
16
NIKON
NSR1505G6E
G Line Stepper
19
NIKON
NSR1505G7E
G Line Stepper
3
Oshitari Laboratory
SNOQ-750
Polyimide Bake Oven
3
TEL
MARK-II
Resist Coater
9
TEL
MARK-II
Resist Developer
8
THIN FILMS
Make
Model
General Description
Quantity
Applied Materials
P-5000
CVD
1
ASM
Plasma 3
Silane PECVD
1
ASM
Plasma 3A
Silane PECVD
3
Genus
87xx
Tungsten Deposition
2
TOK
TR6132-UD
Spin on Dielectric Track
1
Watkins Johnson
WJ1000T
Teos Deposition
1
Watkins Johnson
WJ999
Silane Deposition
2
WET ETCH / CLEAN
Make
Model
General Description
Quantity
Dan
Special_DAN
Wet Process Station
3
Haruna
Special_Sugai
Wet Process Station
1
Sugai
Special_Sugai
Wet Process Station
12
Sugai
Special_Sugai
Wafer Cassette Cleaner
1 |
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