GE Auction

Offered as a complete package DIFFUSION Make Model General Description Quantity SVG SVG_6105 Vertical Furnace 4 TEL UL2604_08H 4 Stack Horizontal - HT Anneal 2 TEL UL2604_08H 4 Stack Horizontal 1 TEL UL2604_08L 4 Stack Horizontal - LPCVD Silane / N20 1 TEL UL2604_08L 4 Stack Horizontal - LPCVD Silane 3 TEL UL2604_08L 4 Stack Horizontal - LP 1 Thermco / SVG 5204_HTR5103 4 Stack Horizontal - POCL 1 Thermco / SVG 5204_HTR5103 4 Stack Horizontal - Wet / Dry Oxide 1 Thermco / SVG 5204_HTR5103 4 Stack Horizontal - Wet Oxide / H2 Anneal 2 Thermco / SVG 5204_HTR5103 4 Stack Horizontal - N2 Anneal / Dry Oxide 1 Thermco / SVG 5204_HTR5103 4 Stack Horizontal - Dry Oxide / Wet Oxide 1 Thermco / SVG 5204_HTR5103 4 Stack Horizontal - Wet Oxide 1 ETCH Make Model General Description Quantity Anelva ILD4015 Oxide Etcher 1 Applied Materials AME8310 Metal Etcher 9 Applied Materials AME8310 Oxide Etcher 6 Applied Materials AME8330 Metal Etcher 12 FUSION 202MCU Microwave Asher 1 Lam Research LAM490 Nitride Etcher 5 Lam Research LAM490 Pad Etcher 1 Lam Research LAM490 Poly Etcher 2 Lam Research LAM590 Pad Etcher 5 Lam Research RAINBOW 4420 Poly Etcher 3 Lam Research RB4400 Poly Etcher 4 Plasma Systems Corporation (PSC) PE-615L Single Wafer Asher 4 Plasma Systems Corporation (PSC) PSC304 Two Chamber Barrel Asher 1 Plasma Systems Corporation (PSC) PSC354 Two Chamber Barrel Asher 7 IMPLANT Make Model General Description Quantity Varian 120XP High Current Implant 5 Varian 160XP High Current Implant 1 Varian 350D Medium Current Implant 3 METALLIZATION Make Model General Description Quantity Ulvac MCH4500 TI Deposition 2 Varian V3280 AL / SI Deposition 3 Varian V3290 AL / SI Deposition 1 PHOTO Make Model General Description Quantity Canon AIM-630 Wafer Tiltler 2 DNS DNS-629 Resist Coater 1 DNS DNS-636 Resist Coater 3 DNS DNS-636 Resist Developer 5 DNS DNS-636 Solvent Strip - Resist 1 KLA-Tencor KLA-5011 Overlay Measurement 1 NIKON NSR1505G4D G Line Stepper 16 NIKON NSR1505G6E G Line Stepper 19 NIKON NSR1505G7E G Line Stepper 3 Oshitari Laboratory SNOQ-750 Polyimide Bake Oven 3 TEL MARK-II Resist Coater 9 TEL MARK-II Resist Developer 8 THIN FILMS Make Model General Description Quantity Applied Materials P-5000 CVD 1 ASM Plasma 3 Silane PECVD 1 ASM Plasma 3A Silane PECVD 3 Genus 87xx Tungsten Deposition 2 TOK TR6132-UD Spin on Dielectric Track 1 Watkins Johnson WJ1000T Teos Deposition 1 Watkins Johnson WJ999 Silane Deposition 2 WET ETCH / CLEAN Make Model General Description Quantity Dan Special_DAN Wet Process Station 3 Haruna Special_Sugai Wet Process Station 1 Sugai Special_Sugai Wet Process Station 12 Sugai Special_Sugai Wafer Cassette Cleaner 1