Technical Library | 1999-08-05 10:45:36.0
In 1998, the International 300 mm Initiative (I300I) demonstration and characterization programs will focus on 180 nm technology capability. To support these activities, I300I and equipment supplier demonstration partners must use starting silicon wafers with key parameters specified at a level appropriate level for 180 nm processing, including contamination and lithographic patterning. This document describes I300I's silicon wafer specifications, as developed with the I300I Silicon Working Group (member company technical advisors) and SEMI Standards.
Technical Library | 2014-09-04 17:43:19.0
The counterfeiting of electronic components has become a major challenge in the 21st century. The electronic component supply chain has been greatly affected by widespread counterfeit incidents. A specialized service of testing, detection, and avoidance must be created to tackle the worldwide outbreak of counterfeit integrated circuits (ICs). So far, there are standards and programs in place for outlining the testing, documenting, and reporting procedures. However, there is not yet enough research addressing the detection and avoidance of such counterfeit parts. In this paper we will present, in detail, all types of counterfeits, the defects present in them, and their detection methods. We will then describe the challenges to implementing these test methods and to their effectiveness. We will present several anti-counterfeit measures to prevent this widespread counterfeiting, and we also consider the effectiveness and limitations of these anti-counterfeiting techniques.
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