SUPPLIER: EquipNet, Inc.
Trion Technology APO111- Apollo Photoresist Strip System
Model: |
Trion Technology APO111- Apollo Photoresist Strip System |
Category: |
|
Model Year: |
2016 |
Condition: |
|
Value: |
$ 60000.00 |
Location: |
Florida, USA |
Offered by: |
|
Contact Supplier |
Trion APO111 Apollo Photoresist Strip System
Location: FL, USA
Level of Removal: Still Installed
Equipment Description:
Trion APO111 Apollo Photoresist Strip System
Includes as standard:
- Apollo III reactor radially designed plenum
- Genmark 3-Axis pick and place robot
- System controller (includes Pentium computer and touch screen interface)
- Inductively coupled plasma source with 1250 watt 13.56 MHz RF generator
- One each mass flow controller (O2) (Expansion available to three total MFC's)
- Temperature control of bottom electrode from 50C to 250C
- Automatic pressure control
- Optical endpoint detection system
- Additional monitor and VGA port
- 60 cfm non-corrosive dry pump; Ebara S20P
- Emergency Off and AC distribution
- Installation for maintenance and operator
- 12 Month service warranty (includes parts and labor)
Options:
- Recirculating temperature controller (SMC HRS012-AN-20)
- Custom end effector (heated with custom vacuum configuration)
- Additional Optical endpoint detection system for O2 plasma process and installation
- Integration of RS-232 Barcode Scanner to system computer
- ICP Matching Network presets
- Software Version: Apollo_2.51_Bld3
- Note: Wafer Size Configured To: 100 mm; Wafer Size Capacity: 300 mm
Specifications:
- Manufacturer Name: Trion Technology
- Year: 2016
- Serial Number: APO 111 5597 #13
- CE marked: NO
- Model: APO111
- Voltage: 220 VOLTS
- Frequency: 60 HERTZ
- Phase: 3
- Current: 15 AMPS
- Dimensions: Standard- 95 x 22 x 62 IN - 570 LBS Metric- 2413.00 x 558.80 x 1574.80 mm - 258.55 kg
Additional Information:
- General Description: Trion Apollo Plasma Asher
- Tool ID: TRION13
- Fab Process: Resist Removal, Descum
- Manufacturer: Trion Technology
- Model Number: APO111
- Serial number: APO 111 5597 #13
- Year of manufacture: 2016
- Country of Origin: US
- Wafer size configured to:
- Wafer size upgradable to (if known): 100mm
- 300mm
- Software version: Apollo_2.51_Bld3
- Tool Status: (disconnected, in warehouse, crated, cold shutdown in fab, online, running): if not crated please list date expected to be moved out: Disconnected, currently stored in Fab.
Hardware Configuration Information:
- Main system:
- Process chambers (Qty and status): 1
- Handling system: Genmark robot
- Other Hardware Configuration: 1250W 13.56MHz ICP Matching Network, Bottom electrode Temp control, range 50C-250C, Automatic pressure control
- Options included: Heated end effector
- System condition/ last used: Last used 4/5/18
- Known Faulty parts / Major missing Components (if none please specify): None- Idled as working tool
- SMIF System /Load ports: No
- Upgrades/ Special features: N/A
- Facilities: Supply Voltage, sub fab items 220V, 15A, 3P
- Support Equipment: -Pumps sold with: 1 Ebara S20P -Chillers sold with: 1 SMC HRS012-AN-20
- Used for (please list metals or chemicals used in processing): Oxygen etchant used for organic material removal.
Link to Listing: https://www.equipnet.com/trion-apo111-apollo-photoresist-strip-system-listid-601307/
Ask Price: $60,000.00 USD or Make An Offer