Umut Tosun, M.S.Chem.Eng., Application Technology Manager at ZESTRON, the global leader in high precision cleaning products and services for the electronics manufacturing industry, will present “Troubleshooting Your Cleaning Process for High Reliability” on Sunday, February 26th (2 pm to 5 pm) at the IPC APEX Expo 2012.
The precision cleaning market has gained tremendous momentum due to the move to lead-free pastes and the corresponding increased reflow profiles. Low standoff devices and miniaturization have raised the bar for cleaning performance when the demand for high reliability is paramount. As a result, equipment and chemical suppliers are driven to innovate like never before: today's aqueous-based cleaning processes have improved cleanliness levels and lowered overall cleaning costs while proving to be safe, environmentally friendly alternatives to traditional solvent-based agents. While limited budget and staff can decrease focus on the cleaning process, daily operational procedures and "how-to" tools are available. In addition to providing insight on these procedures and tools, this course will offer attendees the opportunity to discuss their process problems in order to derive practical solutions.
What you will learn:
- Process problem identification
- General mechanical and chemical interactions and impact
- Hands-on, troubleshooting guidelines (foaming, rinsing, drying, etc.)
- Identifying cost drivers and implementing cost-savings measures
- For more information and to register, please visit http://www.ipcapexexpo.org/html/main/professional-development.htm.
Headquartered in Manassas, Virginia, and operating in more than 35 countries, ZESTRON is the globally leading provider of high precision cleaning products, services and training solutions for the electronics manufacturing industry. With five worldwide technical centers and the largest team of chemical engineers in the industry, ZESTRON’s commitment to ensuring that its customers surpass even the most stringent cleaning requirements is without equal.