Anda Technologies today announced plans to exhibit at the 2022 IPC APEX EXPO, scheduled to take place Jan. 25-27, 2022 at the San Diego Convention Center in California. The team will showcase the Anda AP-3P for the first time in the US in Booth #1307.
Winner of the 2020 NPI Award, 2019 GLOBAL Technology Award and 2019 Mexico Technology Award, the Anda AP-3 Series are advanced atmospheric pressure plasma treatment machines that are equipped with servo motors and a high-speed ball screw linear actuator system for accuracy. As standard, the AP-3P machine is equipped with a single plasma nozzle situated above the substrate to treat, clean and activate surfaces from the top side only. Also available as an optional model, the AP-3DP utilizes dual plasma nozzles top and bottom (single nozzle above and single nozzle below substrate) two nozzles working simultaneously while performing their own independent plasma treatment motion path or program.
Plasma treatment removes static electricity and contaminants such as fine dust, oil, grease, microbial organisms, and both organic/inorganic compounds while also providing surface modification which facilitates adhesion of various coatings and/or adhesive materials. Additionally, plasma treatment promotes the flow of coatings for thin-film coating without other mechanical or chemical treatments required.
To learn more, stop by Booth #1307 at the IPC APEX EXPO or visit www.anda.us.
Anda Automation was founded in 1999 with headquarters in Dongguan, China. The company also has offices in Fremont in California, Guadalajara in Mexico, Penang in Malaysia, Hong Kong, Suzhou & Changsha in China and 20 service centers worldwide. Anda develops high precision dispensing/coating valves, linear motor, servo linear guide, polymer mineral casting and optical assembly equipment. In the fluid application area, Anda offers unique technologies to fabricate high precision dispensers, coating machines, UV & Thermal curing ovens and plasma cleaning equipment. For more information, visit http://www.anda.us/.