Technical Library: wafer (Page 1 of 3)

Key Advances in Void Reduction in the Reflow Process Using Multi-Stage Controlled Vacuum

Technical Library | 2020-01-28 00:23:58.0

This paper explores new advances in the reflow soldering process including vacuum technology and warpage mitigation systems. The first topic for discussion will be the implementation of a vacuum process directly in a conventional inline soldering system. The second topic presented is the mitigation of warpage on substrates or wafers.

Heller Industries Inc.

Pushing the barriers of wafer level device integration: High-speed assembly, the case for MicroTape.

Technical Library | 2009-01-21 23:01:49.0

Over the last 10 years, the adoption of wafer-level packaging (WLP) has expanded to a wide range of semiconductor devices applied in a crosssection of industries from Automotive to Mobile Phone, Sensors to Medical Technology.

Siemens Process Industries and Drives

Next-Generation Test Equipment For High-Volume Wafer Production

Technical Library | 2010-06-23 21:59:03.0

Quality control is one of the main bottlenecks in the production of micro-opto-electromechanical systems/microelectromechanical systems (MOEMS/MEMS) because each structure on a wafer is serially inspected and scanned stepwise over the entire wafer area.

SPIE - International Society for Optical Engineering

Wafer-Level Packaging (WLP) and Its Applications

Technical Library | 2023-10-23 18:28:42.0

This application note discusses the Maxim Integrated's wafer-level packaging (WLP) and provides the PCB design and surface-mount technology (SMT) guidelines for the WLP

Maxim Integrated Circuits

Redundancy Yield Model for SRAMS

Technical Library | 1999-05-07 10:14:57.0

This paper describes a model developed to calculate number of redundant good die per wafer. A block redundancy scheme is used here, where the entire defective memory subarray is replaced by a redundant element. A formula is derived to calculate the amount of improvement expected after redundancy. This improvement is given in terms of the ratio of the overall good die per wafer to the original good die per wafer after considering some key factors.

Intel Corporation

New Precision Coating Deposition Method for Photovoltaic Manufacturing

Technical Library | 2009-05-28 18:15:46.0

Considerable effort is ongoing to improve the efficiency and to move towards high-volume manufacturing of photovoltaic cells. Much attention has been focused on developing in-line processes to replace the current batch processes. A critical process to improve the performance of solar wafers is the application of Dopants. The basic requirement for this process is an automated method for applying a very thin, uniform film of Dopant to the silicon wafer as part of an in-line manufacturing process.

Ultrasonic Systems, Inc.

Reliability Enhancement of Wafer Level Packages with Nano-Column-Like Hollow Solder Ball Structures

Technical Library | 2012-01-12 22:51:19.0

In this paper, hollowed solder ball structures in wafer level packages are investigated. Detailed 3-D finite element modelling is conducted for stress and accumulated inelastic strain energy density or creep strain analysis. Three cases are studied in thi

Lamar University - Department of Mechanical Engineering

Screen and Stencil Printing Processes for Wafer Backside Coating

Technical Library | 2009-09-09 15:08:19.0

Stencil printing equipment has traditionally been used in the surface mount assembly industry for solder paste printing. In recent years the flexibility of the tool has been exploited for a wide range of materials and processes to aid semiconductor packaging and assembly. One such application has been the deposition of adhesive coatings onto the backside of silicon wafers.

ASM Assembly Systems (DEK)

Silicon Test Wafer Specification for 180 nm Technology

Technical Library | 1999-08-05 10:45:36.0

In 1998, the International 300 mm Initiative (I300I) demonstration and characterization programs will focus on 180 nm technology capability. To support these activities, I300I and equipment supplier demonstration partners must use starting silicon wafers with key parameters specified at a level appropriate level for 180 nm processing, including contamination and lithographic patterning. This document describes I300I's silicon wafer specifications, as developed with the I300I Silicon Working Group (member company technical advisors) and SEMI Standards.

SEMATECH

Wafer-Level Packaged MEMS Switch With TSV

Technical Library | 2012-02-02 19:09:53.0

A miniaturized wafer-level packaged MEMS acceleration switch with through silicon vias (TSVs) was fabricated, based on technologies suitable for harsh environment applications. The high aspect ratio TSVs were fabricated through the silicon-on-insulator (S

The Foundation for Scientific and Industrial Research - SINTEF

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wafer searches for Companies, Equipment, Machines, Suppliers & Information

Heller Industries Inc.
Heller Industries Inc.

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