Silicon Test Wafer Specification for 180 nm Technology

Published:

August 5, 1999

Author:

Goodall, Randy

Abstract:

In 1998, the International 300 mm Initiative (I300I) demonstration and characterization programs will focus on 180 nm technology capability. To support these activities, I300I and equipment supplier demonstration partners must use starting silicon wafers with key parameters specified at a level appropriate level for 180 nm processing, including contamination and lithographic patterning. This document describes I300I's silicon wafer specifications, as developed with the I300I Silicon Working Group (member company technical advisors) and SEMI Standards....

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Company Information:

An association of member companies cooperating on research in key areas of semiconductor technology, with a strong focus on thin-film photovoltaic (PV) manufacturing.

Albany, New York, USA

Association / Non-Profit

  • Phone (518) 649-1000

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